{"id":1289,"date":"2017-04-06T14:14:49","date_gmt":"2017-04-06T11:14:49","guid":{"rendered":"http:\/\/polymerjournal.kiev.ua\/en\/?page_id=1289"},"modified":"2017-10-23T21:59:02","modified_gmt":"2017-10-23T18:59:02","slug":"sysyuk_granchak","status":"publish","type":"page","link":"http:\/\/polymerjournal.kiev.ua\/en\/sysyuk_granchak\/","title":{"rendered":"2016 (4) 7"},"content":{"rendered":"

https:\/\/doi.org\/10.15407\/polymerj.38.04.319<\/a><\/p>\n

Composition materials for the manufacture of photopolymer stamps\u00a0 laser engraving<\/strong><\/p>\n

\u00a0<\/em><\/strong><\/p>\n

V.G. Sysyuk<\/em><\/strong>, V.M. Granchak<\/em><\/strong>, P.M. Daviskiba<\/em><\/strong>, V.K. Grishchenko<\/em><\/strong>, V.Z. Mayik<\/em><\/strong><\/p>\n

 <\/p>\n

Institute of Makromolecular Chemistry NAS of Ukraine<\/p>\n

48, Kharkivske sh\u043ese, Kyiv, 02160, Ukraine, \u0435-mail: sisyuk-valentina@yandex.ua<\/p>\n

Institute of physical chemistry of L.V. Pisarzhevsky NAS of Ukraine<\/p>\n

31, prosp. Nauky, Kyiv, 03028, Ukraine<\/p>\n

Ukrainian Academy of Printing<\/p>\n

19, st. Pidgolosko, Lviv, 79020, Ukraine<\/p>\n

 <\/p>\n

Polym. J., 2016, 38<\/strong>, no. 4: 319-325.<\/p>\n

 <\/p>\n

Section: Structure and properties.<\/p>\n

 <\/p>\n

Language: Ukrainian.<\/p>\n

 <\/p>\n

Abstract:<\/p>\n

The development and study of properties photopolymerized composition materials with superior photochemical and physico-mechanical characteristics for the manufacture of photopolymer stamps in technology of printing, namely, hot foil stamping for printed products finishing. Features the manufacture of photopolymer stamps is the use of direct laser engraving in the formation of focused laser beam. Achieved the possibility of implementing the process \u201ccomputer <\/em>\u2013 photopolymer stamp\u201d. To achieve the desired properties of the materials in its composition added developed oligomeric modifiers based on silicone acrylates and acrylate with tertiary amino group. We investigated the deformation properties, wear resistance, thermal resistance photopolymer stamps, optimized materials in accordance to requirements of their operation.<\/em><\/p>\n

\u00a0<\/strong><\/p>\n

Keywords:<\/strong> photopolymerization, oligomeric modifiers, photoactivity, photopolymer stamp, laser engraving.<\/p>\n

 <\/p>\n

\u041b\u0456\u0442\u0435\u0440\u0430\u0442\u0443\u0440\u0430<\/strong><\/p>\n

    \n
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     <\/p>\n

     <\/p>\n","protected":false},"excerpt":{"rendered":"

    https:\/\/doi.org\/10.15407\/polymerj.38.04.319 Composition materials for the manufacture of photopolymer stamps\u00a0 laser engraving \u00a0 V.G. Sysyuk, V.M. Granchak, P.M. Daviskiba, V.K. Grishchenko, V.Z. Mayik   Institute of Makromolecular Chemistry NAS of Ukraine 48, Kharkivske sh\u043ese, Kyiv, 02160, Ukraine, \u0435-mail: sisyuk-valentina@yandex.ua Institute of physical chemistry of L.V. Pisarzhevsky NAS of Ukraine 31, prosp. Nauky, Kyiv, 03028, Ukraine Ukrainian […]<\/p>\n","protected":false},"author":1,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":[],"acf":[],"_links":{"self":[{"href":"http:\/\/polymerjournal.kiev.ua\/en\/wp-json\/wp\/v2\/pages\/1289"}],"collection":[{"href":"http:\/\/polymerjournal.kiev.ua\/en\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"http:\/\/polymerjournal.kiev.ua\/en\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"http:\/\/polymerjournal.kiev.ua\/en\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"http:\/\/polymerjournal.kiev.ua\/en\/wp-json\/wp\/v2\/comments?post=1289"}],"version-history":[{"count":3,"href":"http:\/\/polymerjournal.kiev.ua\/en\/wp-json\/wp\/v2\/pages\/1289\/revisions"}],"predecessor-version":[{"id":1739,"href":"http:\/\/polymerjournal.kiev.ua\/en\/wp-json\/wp\/v2\/pages\/1289\/revisions\/1739"}],"wp:attachment":[{"href":"http:\/\/polymerjournal.kiev.ua\/en\/wp-json\/wp\/v2\/media?parent=1289"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}